Rehovot, Israel

Yuri Shirman

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011-2022

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2 patents (USPTO):Explore Patents

Title: Innovations of Inventor Yuri Shirman

Introduction

Yuri Shirman is a notable inventor based in Rehovot, Israel, recognized for his contributions to the field of semiconductor device metrology. With a total of two patents to his name, Shirman's work focuses on advancing optical metrology and inspection techniques.

Latest Patents

Shirman's latest patents include "Time-domain optical metrology and inspection of semiconductor devices" and "Method and system for providing a compensated Auger spectrum." The first patent involves creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device. This innovation allows for the selection of an earlier-in-time portion of the time-domain representation to determine measurements of parameters of interest through model-based processing. The second patent presents a system for generating a compensated Auger spectrum, which utilizes a processor to respond to a non-compensated Auger spectrum and an electric potential related parameter, enhancing the accuracy of electron detection from a charged particle beam.

Career Highlights

Throughout his career, Yuri Shirman has worked with prominent companies such as Applied Materials Israel Limited and Nova Corporation. His experience in these organizations has contributed significantly to his expertise in semiconductor technologies and metrology.

Collaborations

Shirman has collaborated with notable professionals in his field, including Dror Shemesh and Gilad Barak. These partnerships have likely fostered innovation and development in his projects.

Conclusion

Yuri Shirman's contributions to semiconductor device metrology through his patents and career experiences highlight his role as an influential inventor in the industry. His work continues to impact the field of optical metrology and inspection techniques.

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