Yung-Meng Huang

Title: Innovations of Yung-Meng Huang

Introduction

Yung-Meng Huang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on advanced structures and methods that enhance the performance of electronic devices.

Latest Patents

Among his latest patents is the "Embedded bit line structure, field effect transistor structure with the same and method of fabricating the same." This invention describes an embedded bit line structure that includes a substrate with an insulator layer and a semiconductor layer. The design allows for improved electrical connections within active areas of the device. Another notable patent is the "Method of forming emitter tips on a field emission display." This method involves creating a conductive layer on a substrate and using plasma etching to shape emitter tips, which are crucial for the functionality of field emission displays.

Career Highlights

Yung-Meng Huang is currently employed at Nan Ya Technology Corporation, where he continues to innovate in the semiconductor industry. His expertise in fabricating advanced electronic components has positioned him as a key player in his field.

Collaborations

He has collaborated with notable colleagues such as Chi-Hei Lin and Ching-Nan Hsiao, contributing to various projects that push the boundaries of technology.

Conclusion

Yung-Meng Huang's contributions to semiconductor technology through his patents and work at Nan Ya Technology Corporation highlight his role as an influential inventor. His innovative approaches continue to shape the future of electronic devices.