The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Nov. 22, 2002
Yung-meng Huang, Taipei, TW;
Yung-Meng Huang, Taipei, TW;
Nanya Technology Corporation, Taoyuan, TW;
Abstract
A method of forming emitter tips on a field emission display. A conductive layer is formed on a substrate, and then a photoresist layer is formed on the conductive layer wherein the photoresist layer has at least a pattern for defining predetermined areas of the emitter tips. Next, using plasma etching with the pattern of the photoresist layer as a mask, the conductive layer is etched to become a plurality of emitter stages. The etching rate of the conductive layer is greater than the etching rate of the photoresist layer. Finally, continuous use of plasma etching with an increased vertical-etching rate etches the lateral sidewalls of the emitter stages, thus shaping them as emitter tips.