This inventor holds 5 USPTO granted patents and 4 published patent applications. Top assignees: Hefei University of Technology, Other. Active years: 2009-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009-2014
Title: Yuling Liu: Innovator in Ultra Large Scale Integrated Circuits
Introduction
Yuling Liu is a prominent inventor based in Tianjin, China. He has made significant contributions to the field of ultra large scale integrated circuits, holding a total of 5 patents. His innovative methods have advanced the technology used in the polishing and cleaning of copper wiring surfaces.
Latest Patents
Yuling Liu's latest patents include a method of polishing copper wiring surfaces in ultra large scale integrated circuits. This method involves preparing a polishing solution that contains a specific composition of nano SiO abrasive, deionized water, an oxidant, an active agent, and a chelating agent. The polishing process is conducted under precise conditions of pressure, temperature, slurry flow rate, and rotational speed. Another notable patent is a method of cleaning copper material surfaces in ultra large scale integrated circuits after polishing. This method utilizes a water-soluble cleaning solution with a carefully balanced pH and involves washing the copper surfaces under controlled pressure and flow rate.
Career Highlights
Throughout his career, Yuling Liu has worked with various institutions, including Hefei University of Technology. His work has focused on enhancing the efficiency and effectiveness of processes related to integrated circuits, making him a valuable asset in the field of electronics.
Collaborations
Yuling Liu has collaborated with notable colleagues, including Na Liu and Xinhuan Niu. These partnerships have contributed to the development of innovative solutions in the industry.
Conclusion
Yuling Liu's contributions to the field of ultra large scale integrated circuits through his patents and collaborative efforts highlight his role as a key innovator. His work continues to influence advancements in technology and manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile