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For the Inventor, By the Inventor

Joetsu, Japan

Yukio Shibano

This inventor holds 15 USPTO granted patents and 1 published patent application and 4 EPO patents, primarily in Quartz Glass Substrates. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2002-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukio Shibano. Retrieved from https://idiyas.com/inventor/yukio-shibano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 15 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 69(Granted Patents)


Location History:

  • Nakakubiki-gun, JP (2002 - 2005)
  • Niigata-ken, JP (2007 - 2011)
  • Joetsu, JP (2007 - 2018)

Company Filing History:

goldMedal15 out of 5,989 
 
Shin-Etsu Chemical Co., Ltd.
 patents

Years Active: 2002-2018

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Areas of Expertise:
Polishing Agent
Synthetic Quartz
Photomask
Glass Substrate
Recycling
Large-Size Substrate
Preparation Method
Wafer Polishing
Silica Glass
Mother Glass
Leveling
Computer-Readable Medium
15 patents (USPTO):Explore Patents
1. 9919962 - Polishing agent for synthetic quartz glass substrate (2018-03-20),
2. 9316902 - Photomask-forming glass substrate and making method (2016-04-19),
3. 8551346 - Photomask-forming glass substrate and making method (2013-10-08),
4. 8460061 - Method for producing large-size synthetic quartz glass substrate (2013-06-11),
5. 8012563 - Large-size substrate (2011-09-06),
6. 7906256 - Recycling of large-size photomask substrate (2011-03-15),
7. 7745071 - Large-sized glass substrate (2010-06-29),
8. 7608542 - Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method (2009-10-27),
9. 7588481 - Wafer polishing method and polished wafer (2009-09-15),
10. 7191618 - Large-sized substrate and method of producing the same (2007-03-20),
11. 7183210 - Method for preparing large-size substrate (2007-02-27),
12. 6928837 - Silica glass substrates and their selection (2005-08-16),
13. 6869732 - Glass substrate for photomasks and preparation method (2005-03-22),
14. 6855908 - Glass substrate and leveling thereof (2005-02-15),
15. 6413682 - Synthetic quartz glass substrate for photomask and making method (2002-07-02),

Title: Innovations of Yukio Shibano

Introduction

Yukio Shibano is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced polishing agents and photomask-forming glass substrates. With a total of 15 patents to his name, Shibano's work has had a considerable impact on various industries.

Latest Patents

One of his latest patents is a polishing agent for synthetic quartz glass substrates. This innovative agent is characterized by containing a colloidal solution of colloidal silica with a concentration of 20-50% by mass, along with a polycarboxylic acid polymer, an acidic amino acid, a phenol, or a glycosaminoglycan. Another notable patent is for a photomask-forming glass substrate and its manufacturing method. This substrate features a square major surface with two defined strip regions, ensuring precise specifications for high-quality photomasks.

Career Highlights

Throughout his career, Yukio Shibano has worked with esteemed companies such as Shin-Etsu Chemical Co., Ltd. His expertise in materials science has led to numerous advancements in the production and application of glass substrates and polishing agents.

Collaborations

Shibano has collaborated with notable colleagues, including Atsushi Watabe and Masaki Takeuchi. Their combined efforts have contributed to the success of various projects and innovations in the field.

Conclusion

Yukio Shibano's contributions to the field of materials science through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in technology and industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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