The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Dec. 10, 2010
Daijitsu Harada, Joetsu, JP;
Mamoru Morikawa, Joetsu, JP;
Masaki Takeuchi, Joetsu, JP;
Yukio Shibano, Joetsu, JP;
Daijitsu Harada, Joetsu, JP;
Mamoru Morikawa, Joetsu, JP;
Masaki Takeuchi, Joetsu, JP;
Yukio Shibano, Joetsu, JP;
Shin-Etsu Chemcial Co., Ltd., Tokyo, JP;
Abstract
A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 μm.