The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Jul. 15, 2004
Applicants:
Daisuke Kusabiraki, Niigata-ken, JP;
Yukio Shibano, Niigata-ken, JP;
Inventors:
Daisuke Kusabiraki, Niigata-ken, JP;
Yukio Shibano, Niigata-ken, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A large-size substrate adapted for light exposure is of a plate shape having a diagonal length or diameter of 500-2,000 mm, a thickness of 1-20 mm, and a peripheral surface with a roughness Ra of 0.05-0.4 μm. The number of particles released from the substrate periphery during cleaning is minimized, leading to an improved yield in the cleaning step. The substrate can be manually handled, achieving an improvement in substrate quality without a need for a handling mechanism.