Joetsu, Japan

Daisuke Kusabiraki



Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Joetsu, JP (2007 - 2009)
  • Niigata-ken, JP (2011)

Company Filing History:


Years Active: 2007-2011

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3 patents (USPTO):Explore Patents

Title: The Innovations of Daisuke Kusabiraki

Introduction

Daisuke Kusabiraki, based in Joetsu, Japan, is a prominent inventor known for his innovative contributions in the field of substrate technology. With a total of three patents to his name, Kusabiraki has made significant advancements that enhance the quality and efficiency of substrate usage in various applications.

Latest Patents

One of Kusabiraki's notable inventions is a large-size substrate designed for light exposure. This plate-shaped substrate measures between 500 to 2,000 mm in diagonal length or diameter and has a thickness ranging from 1 to 20 mm. It features a peripheral surface roughness of Ra 0.05-0.4 µm, which minimizes the number of particles released during cleaning. This innovation leads to improved yield during the cleaning step while allowing for manual handling, enhancing the overall quality of the substrate without requiring a complex handling mechanism.

Additionally, Kusabiraki has developed a large-size glass substrate intended for photomask formation. This involves a meticulous preparation process that accounts for various factors, including height data and corrective measures for deformation due to weight and exposure apparatus chucking. These enhancements ensure highly precise photomask substrates that are crucial for advanced manufacturing processes.

Career Highlights

Daisuke Kusabiraki's career includes significant tenure at Shin-Etsu Chemical Co., Ltd., where he has focused on developing advanced substrate technologies. His work has vastly contributed to the field, pushing boundaries with patented innovations that serve critical roles in manufacturing.

Collaborations

Throughout his career, Kusabiraki has worked alongside esteemed colleagues, including Yukio Shibano and Shuhei Ueda. Their collaborative efforts have furthered the advancements in substrate technology, helping to foster innovative solutions for industry challenges.

Conclusion

Daisuke Kusabiraki stands out as a key figure in innovation, specifically within substrate technology. With his patents showcasing a blend of practicality and advanced engineering, he continues to influence the landscape of manufacturing processes, ensuring that high-quality substrates meet the growing demands of modern applications. His contributions not only reflect his expertise but also underscore the significance of collaboration in driving innovation forward.

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