The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Oct. 09, 2014
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Daijitsu Harada, Joetsu, JP;
Masaki Takeuchi, Joetsu, JP;
Yukio Shibano, Joetsu, JP;
Shuhei Ueda, Joetsu, JP;
Atsushi Watabe, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 19/00 (2006.01); B24B 1/00 (2006.01); B24B 37/005 (2012.01); C09G 1/04 (2006.01); C09K 3/14 (2006.01); C09K 13/06 (2006.01); B24B 37/00 (2012.01); C09G 1/02 (2006.01); C03C 15/02 (2006.01); C09K 13/02 (2006.01);
U.S. Cl.
CPC ...
C03C 19/00 (2013.01); B24B 1/00 (2013.01); B24B 37/00 (2013.01); B24B 37/0056 (2013.01); C03C 15/02 (2013.01); C09G 1/02 (2013.01); C09G 1/04 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); C09K 13/02 (2013.01); C09K 13/06 (2013.01);
Abstract
Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.