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For the Inventor, By the Inventor

Kyoto, Japan

Yukio Ono

This inventor holds 9 USPTO granted patents. Top assignees: Screen Holdings Co., Ltd., Screen Holdings Co., Ltd.. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukio Ono. Retrieved from https://idiyas.com/inventor/yukio-ono-c2kenqp8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9

% Patents Active = 88.9

Average Co-Inventor Count = 1.2

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:

goldMedal8 out of 1,123 
 
Screen Holdings Co., Ltd.
 patents
silverMedal1 out of 153 
 
Screen Holdings Co., Ltd.
 patents

Years Active: 2018-2026

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9 patents (USPTO):Explore Patents
1. 12598940 - Method for measuring temperature (2026-04-07),
2. 12154800 - Heat treatment apparatus and heat treatment method (2024-11-26),
3. 11251057 - Thermal processing method and thermal processing device (2022-02-15),
4. 10998206 - Light irradiation type heat treatment apparatus (2021-05-04),
5. 10755948 - Heat treatment method by light irradiation (2020-08-25),
6. 10636676 - Heat treatment method and heat treatment apparatus of light irradiation type (2020-04-28),
7. 10490465 - Thermal processing method and thermal processing apparatus through light irradiation (2019-11-26),
8. 10297514 - Thermal processing method and thermal processing apparatus through light irradiation (2019-05-21),
9. 9922889 - Thermal processing method and thermal processing apparatus through light irradiation (2018-03-20),

Title: Innovations of Yukio Ono in Heat Treatment Technology

Introduction

Yukio Ono is a prominent inventor based in Kyoto, Japan, known for his significant contributions to heat treatment technology. With a total of 9 patents, Ono has developed innovative solutions that enhance the efficiency and effectiveness of semiconductor processing.

Latest Patents

One of his latest patents is a heat treatment apparatus and method that utilizes a radiation thermometer with a quantum infrared sensor. This invention allows for accurate temperature measurement of substrates that are subjected to flash light irradiation. The apparatus includes a temperature correction unit that adjusts the temperature of the second substrate based on a correction coefficient derived from reference and shift temperatures. Another notable patent is a thermal processing method and device that involves the use of a dummy wafer and helium gas to create a uniform temperature history for semiconductor wafers. This method eliminates the need for dummy running, streamlining the treatment process.

Career Highlights

Ono's career is marked by his work at Screen Holdings Co., Ltd., where he has played a crucial role in advancing heat treatment technologies. His innovative approaches have not only improved existing processes but have also paved the way for new methodologies in semiconductor manufacturing.

Collaborations

Ono has collaborated with notable colleagues such as Kaoru Matsuo and Kazuhiko Fuse, contributing to a dynamic environment of innovation and research within his company.

Conclusion

Yukio Ono's contributions to heat treatment technology exemplify the impact of innovative thinking in the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes, making him a key figure in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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