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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10636676 B1

PDFFull Text
Date of Patent:
Apr. 28, 2020

Filed:

Jan. 29, 2018

Heat treatment method and heat treatment apparatus of light irradiation type

Applicant:

Screen Holdings Co., Ltd., Kyoto-shi, Kyoto, JP;

Inventors:

Yukio Ono, Kyoto, JP;

Kaoru Matsuo, Kyoto, JP;

Kazuhiko Fuse, Kyoto, JP;

Assignee:

SCREEN HOLDINGS CO., LTD., Kyoto, JP;

Attorney:

McDermott Will & Emery LLP

Primary Examiner:

Robert G Bachner

Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/324 (2006.01); H01J 61/90 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); H01L 21/687 (2006.01); H01L 21/268 (2006.01);
U.S. Cl.
CPC ...
H01L 21/324 (2013.01); H01J 37/3299 (2013.01); H01J 37/32724 (2013.01); H01J 37/32935 (2013.01); H01J 61/90 (2013.01); H01L 21/67115 (2013.01); H01L 21/6875 (2013.01); H01L 21/68707 (2013.01); H01L 21/2686 (2013.01);
Abstract

When pressure in a chamber is once reduced lower than that when a flash of light is emitted and is maintained, after a flash lamp irradiates a semiconductor wafer accommodated in the chamber with the flash of light, a portion in the chamber, where gas is liable to remain, is eliminated. Then, when a flow rate of nitrogen gas to be supplied into the chamber is increased to discharge gas in the chamber, particles flying in the chamber due to flash irradiation can be smoothly discharged. As a result, the particles flying in the chamber can be prevented from being attached to an additional semiconductor wafer.

Find Patent Forward Citations

Ono, Yukio. (2020). Heat treatment method and heat treatment apparatus of light irradiation type (U.S. Patent No. 10636676). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10636676

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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