The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2021

Filed:

Jun. 13, 2019
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventor:

Yukio Ono, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01); H01J 61/16 (2006.01); H01L 21/66 (2006.01); H01J 61/90 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01J 61/16 (2013.01); H01J 61/90 (2013.01); H01L 21/324 (2013.01); H01L 21/67248 (2013.01); H01L 21/68714 (2013.01); H01L 22/20 (2013.01);
Abstract

Prior to heat treatment of a semiconductor wafer to be treated, a dummy wafer is placed on a susceptor made of quartz, and the susceptor is preheated by irradiation with light from halogen lamps. A controller controls an output from the halogen lamps, based on the temperature of the susceptor measured with a radiation thermometer. The radiation thermometer receives infrared radiation of a wavelength longer than 4 μm to measure the temperature of the susceptor. The radiation thermometer is able to receive only infrared radiation emitted from the susceptor to accurately measure the temperature of the susceptor, regardless of whether or not a wafer is held by the susceptor, because quartz is opaque in a wavelength range longer than 4 μm.


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