Oshu, Japan

Yuji Seshimo

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.2

ph-index = 1


Location History:

  • Oshu, JP (2020)
  • Yamanashi, JP (2024)

Company Filing History:


Years Active: 2020-2025

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4 patents (USPTO):Explore Patents

Title: Yuji Seshimo: Innovator in Gas Management and Film Deposition Technologies

Introduction

Yuji Seshimo is a prominent inventor based in Oshu, Japan, known for his contributions to gas management methods and film deposition systems. With a total of four patents to his name, Seshimo has made significant advancements in the field of semiconductor processing.

Latest Patents

Seshimo's latest patents include a gas management method and a substrate processing system. The gas management method involves heating a raw material container to generate a vaporized raw material gas. This gas is then supplied, along with a carrier gas, to a processing container that accommodates a substrate, allowing for effective processing. The method also includes controlling the heater based on the weight of the substrate after processing. Another notable patent is for a method of depositing a silicon oxide film. This method utilizes Atomic Layer Deposition with plasma while heating the substrate to a temperature of 600° C. or higher. After the deposition, the silicon oxide film is annealed at a higher temperature to enhance its properties.

Career Highlights

Yuji Seshimo is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on developing innovative technologies that improve the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Seshimo collaborates with talented colleagues, including Hitoshi Kato and Toru Ishii, to drive forward the research and development of advanced technologies in his field.

Conclusion

Yuji Seshimo's contributions to gas management and film deposition technologies highlight his role as an influential inventor in the semiconductor industry. His innovative patents continue to shape the future of semiconductor processing.

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