Yuefei Chen

Title: Innovations of Yuefei Chen in Projection Exposure Technology

Introduction

Yuefei Chen is a notable inventor based in Shanghai, China. He has made significant contributions to the field of projection exposure technology, holding three patents that showcase his innovative approach to improving alignment and focusing systems in exposure apparatuses.

Latest Patents

Yuefei Chen's latest patents include a projection exposure apparatus and method. This apparatus features a focal plane measuring system and an alignment measuring system, both strategically positioned between a reticle stage and a substrate stage. The alignment measuring system is designed to focus accurately, while the focal plane measuring system measures variations in the surface profile of a substrate. This dual system allows for the computational derivation of the relative positional relationship between the reticle and the substrate, enabling compensation for any profile variations through precise movements of the substrate stage. Additionally, he has developed an exposure device and a method for defocus and tilt error compensation, which enhances alignment accuracy and production yield by integrating focusing and alignment information.

Career Highlights

Yuefei Chen has worked with prominent companies in the semiconductor industry, including Shanghai Micro Electronics Equipment (Group) Co., Ltd. and Shanghai Micro Electronics Equipment Co., Ltd. His work in these organizations has been pivotal in advancing the technology used in projection exposure systems.

Collaborations

Yuefei has collaborated with notable colleagues such as Bing Xu and Xiang Jia, contributing to the development of innovative solutions in the field.

Conclusion

Yuefei Chen's contributions to projection exposure technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in alignment and focusing systems, showcasing the importance of innovation in technology.