The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Jul. 13, 2015
Shanghai Micro Electronics Equipment Co., Ltd., Shanghai, CN;
Feibiao Chen, Shanghai, CN;
Chang Zhou, Shanghai, CN;
Yuefei Chen, Shanghai, CN;
Qi Cheng, Shanghai, CN;
Lei Diao, Shanghai, CN;
Jingchao Qi, Shanghai, CN;
SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD., Shanghai, CN;
Abstract
In an exposure apparatus and a method for defocus and tilt error compensation, each of alignment sensors () corresponds to and has the same coordinate in the first direction as a respective one of focusing sensors (), so that each of the alignment sensors () is arranged on the same straight line as a respective one of the focusing sensors (). As such, alignment marks can be characterized with both focusing information and alignment information. This enables the correction of errors in the alignment information and thus achieves defocus and tilt error compensation, resulting in significant improvements in alignment accuracy and the production yield.