The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2015

Filed:

Dec. 20, 2011
Applicants:

Bing Xu, Shanghai, CN;

Yuefei Chen, Shanghai, CN;

Xiang Jia, Shanghai, CN;

Xiaoqing Yang, Shanghai, CN;

Inventors:

Bing Xu, Shanghai, CN;

Yuefei Chen, Shanghai, CN;

Xiang Jia, Shanghai, CN;

Xiaoqing Yang, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G01B 11/26 (2006.01); G03F 9/00 (2006.01); G01N 21/35 (2014.01);
U.S. Cl.
CPC ...
G01B 11/26 (2013.01); G01N 21/35 (2013.01); G03F 9/7015 (2013.01); G03F 9/7084 (2013.01); G03F 9/7088 (2013.01);
Abstract

A backside alignment apparatus and method for determining a position relationship between a substrate () and a workpiece stage (). The backside alignment apparatus includes: an illumination apparatus () for emanating infrared light; a workpiece stage assembly () for supporting and moving the substrate (); an imaging apparatus () for detecting alignment marks and calculating positions of the alignment marks, the alignment marks including a reference plate alignment mark () and a backside alignment mark (); and a reference plate assembly () for setting up a relationship between position coordinates of the imaging apparatus () and the workpiece stage assembly (). The illumination apparatus () and the imaging apparatus () are able to illuminate and align different alignment marks using only one set of illumination apparatus.


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