Yu-Ru Chang

Title: Yu-Ru Chang: Innovator in Semiconductor Technology

Introduction

Yu-Ru Chang is a prominent inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative solutions that enhance the functionality and efficiency of semiconductor devices.

Latest Patents

One of Yu-Ru Chang's latest patents is titled "Functional spacer for SIP and methods for forming the same." This invention includes a spacer with a recess extending from its top surface, featuring a conductive element that connects various components. The design allows for a die to be attached to the spacer, optimizing the integration of semiconductor devices. Another notable patent is "Substrate structure and the process manufacturing the same." This patent describes a multi-layer substrate structure that facilitates multiple arrangements of power and ground domains. The invention aims to streamline the engineering development phase by allowing flexibility in PCB and system board designs without compromising performance.

Career Highlights

Yu-Ru Chang has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Global Unichip Corporation. His experience in these organizations has contributed to his expertise in developing advanced semiconductor technologies.

Collaborations

Throughout his career, Yu-Ru Chang has collaborated with notable professionals in the field, including Yu-Fang Hsia and Ling-Chih Chou. These collaborations have further enriched his work and innovation in semiconductor technology.

Conclusion

Yu-Ru Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative solutions continue to shape the future of semiconductor design and manufacturing.