Yu Nunoshige

Title: Yu Nunoshige: Innovator in Substrate Processing Technology

Introduction

Yu Nunoshige is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing, holding a total of 9 patents. His work focuses on developing methods and apparatuses that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Among his latest patents, Nunoshige has developed a substrate processing method and apparatus designed for forming a low-resistance metal-containing nitride film. This innovative method includes several steps: providing a substrate in a processing container, forming a metal-containing nitride film by alternately supplying an organic metal-containing gas and a nitrogen-containing gas, modifying the film by generating plasma, and repeating the process for a predetermined number of cycles. Another notable patent involves a substrate processing method that comprises a repeating cycle of supplying source gas, exhausting excess gas, and supplying reaction gas, ensuring optimal conditions for substrate processing.

Career Highlights

Throughout his career, Yu Nunoshige has worked with notable companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to advancements in substrate processing technology.

Collaborations

Nunoshige has collaborated with esteemed colleagues such as Yasushi Fujii and Tsuyoshi Takahashi. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Yu Nunoshige's contributions to substrate processing technology are noteworthy, with a focus on enhancing the efficiency of metal-containing nitride film formation. His innovative patents and collaborations reflect his commitment to advancing the field.