Taipei, Taiwan

Yu-Lun Lin

This inventor holds 5 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2001-2003.


% Patents Active = 100.0

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 16(Granted Patents)


Location History:

  • Taipei, TW (2001 - 2002)
  • Hsin-Chu, TW (2003)

Company Filing History:


Years Active: 2001-2003

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5 patents (USPTO):Explore Patents

Title: Innovations by Yu-Lun Lin

Introduction

Yu-Lun Lin is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in reducing contamination during wafer processing. With a total of 5 patents to his name, Lin's work has had a substantial impact on the efficiency and reliability of semiconductor manufacturing.

Latest Patents

One of Lin's latest patents is an "Apparatus and method for reducing contamination in a wafer transfer chamber." This invention addresses the particle contamination problem in wafer transfer chambers, such as load-lock chambers used in cluster processing tools for semiconductor devices. The design includes a particle filter that isolates a wafer cassette during the chamber's pumping and venting process. This innovation not only reduces particle contamination on the wafers but also significantly decreases the cycle time for pumping and venting the load-lock chamber.

Another notable patent is focused on the "Prevention of defects formed in photoresist during wet etching." This invention tackles the issue of defects at the interface between two oxide layers of different thicknesses, which can occur during the formation of dual gate devices. By exposing the photoresist to a low power plasma containing oxygen before the HF wet dip, Lin's method effectively removes unsaturated chemical bonds from the resist surface, preventing the formation of SiC-based defects that could lead to shorts or opens in polysilicon lines.

Career Highlights

Yu-Lun Lin is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to innovate and contribute to advancements in semiconductor technology. His work has been instrumental in enhancing the quality and performance of semiconductor devices.

Collaborations

Lin has collaborated with notable colleagues, including Yun-Hung Shen and Pin-Yin Shin, who have also contributed to the field of semiconductor research and development.

Conclusion

Yu-Lun Lin's innovative patents and contributions to semiconductor technology demonstrate his commitment to improving manufacturing processes and product quality. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
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