The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2001

Filed:

Mar. 30, 1999
Applicant:
Inventors:

Yun-Hung Shen, Taipei, TW;

Pin-Yin Shin, Taichang, TW;

Shih-Chun Huang, Hsin-Chu, TW;

Yu-Lun Lin, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 1/00 ;
U.S. Cl.
CPC ...
B05C 1/00 ;
Abstract

A photoresist stripper bath includes a filter in a re-circulation line for filtering residual photoresist materials from said bath. The quality of the stripper and the concentration of the photoresist materials are sensed by passing infrared light transversely through the re-circulating line, detecting the intensity of the light passed through the line and comparing the detected level with a threshold value related to the concentration of the photoresist materials in said stripper.


Find Patent Forward Citations

Shen, Yun-Hung. (2001). Method and apparatus for controlling the quality of a photoresist stripper bath (U.S. Patent No. 6203659). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6203659

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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