Hsin-Chu, Taiwan

Yu-Huei Chen


Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 28(Granted Patents)


Location History:

  • Taipei, TW (2004 - 2005)
  • Hsin-Chu, TW (2004 - 2007)

Company Filing History:


Years Active: 2004-2007

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6 patents (USPTO):Explore Patents

Title: An Insight into the Innovations of Inventor Yu-Huei Chen

Introduction

Yu-Huei Chen is a prominent inventor based in Hsin-Chu, Taiwan, known for his significant contributions to the field of semiconductor technology. With a total of six patents under his name, Chen has made impactful advancements that enhance the efficiency and quality of chemical mechanical polishing processes in semiconductor manufacturing.

Latest Patents

Among Chen's latest innovations are two notable patents. The first is titled "EBR shape of spin-on low-k material providing good film stacking," which introduces a new method for tuning the Edge Bead Remove hump. This invention aims to prevent the formation of pointed edges, thereby avoiding the peeling of low-k dielectric films during the Chemical Mechanical Polishing process. The second patent, "Method and system for in-situ monitoring of mixing ratio of high selectivity slurry," details a novel approach to monitor the quality of slurries used in polishing operations. By utilizing laser light to evaluate the slurry’s mixing ratio and overall quality, this method enhances the reliability of the polishing process.

Career Highlights

Yu-Huei Chen works at the Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he applies his innovative ideas to improve manufacturing processes. His expertise lies in semiconductor technology, and his patents reflect a commitment to advancing this critical industry.

Collaborations

Throughout his career, Chen has collaborated with notable colleagues such as Lain-Jong Li and fellow inventor Sung-Ming Jang. Their teamwork and combined expertise contribute to the ongoing success and innovation found within TSMC.

Conclusion

In summary, Yu-Huei Chen is a visionary inventor whose work in semiconductor technology is shaping the future of manufacturing processes. With his latest patents focused on improving the efficiency and quality of chemical mechanical polishing, he continues to play a vital role in advancing the field. His collaborations with esteemed colleagues highlight the importance of teamwork in driving technological innovations.

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