Taipei, Taiwan

Yu-Ching Huang

USPTO Granted Patents = 5 

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 33(Granted Patents)


Location History:

  • Taipei, TW (2009 - 2012)
  • Taichung, TW (2021)
  • New Taipei, TW (2023)

Company Filing History:


Years Active: 2009-2025

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5 patents (USPTO):Explore Patents

Title: Innovations in Semiconductor Technology: The Work of Yu-Ching Huang

Introduction: Yu-Ching Huang is a recognized inventor based in Taichung, Taiwan, known for his contributions to semiconductor technology. He holds a patent that reflects his innovative work in the development of semiconductor devices, particularly those utilizing FinFET technology.

Latest Patents: Yu-Ching Huang's patent, titled "Semiconductor device having FinFET with work function layers and method of manufacturing the same," introduces a novel semiconductor device that incorporates a first fin-type field effect transistor (FinFET). This FinFET is characterized by a first gate structure positioned over a first semiconductor fin. Notably, the gate structure features a first work function layer composed of two distinctive layers: a bar-shaped structure and a U-shaped structure that encapsulates the sides and bottom of the bar layer. This innovative design incorporates different materials for each layer, enhancing the functionality of the semiconductor device.

Career Highlights: Yu-Ching Huang is currently associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC places him at the forefront of technology development, further solidifying his reputation as a skilled inventor.

Collaborations: Throughout his career, Yu-Ching Huang has collaborated with notable colleagues in the field, including Cheng-Chien Li and Wen-Li Chiu. Their collective expertise promotes advancements in semiconductor research and fosters an environment of innovation within their organization.

Conclusion: Yu-Ching Huang's contributions to the field of semiconductor technology underscore the importance of innovation in advancing electronic devices. His patented work exemplifies the potential for breakthroughs in manufacturing techniques and device functionality, marking him as a significant figure in the ongoing evolution of the semiconductor industry.

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