This inventor holds 2 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 2001-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kawachi-machi, JP (2001)
- Kawachi-gun, JP (2004)
Company Filing History:
Years Active: 2001-2004
Title: Innovations of Yozo Fukagawa
Introduction
Yozo Fukagawa is a notable inventor based in Kawachi-gun, Japan. He has made significant contributions to the field of exposure apparatus technology, holding a total of 2 patents. His work focuses on enhancing the precision and efficiency of device manufacturing methods.
Latest Patents
Fukagawa's latest patents include an exposure apparatus and its control method, as well as a stage apparatus and device manufacturing method. The first patent describes an exposure apparatus that features a substrate stage for holding and moving a substrate. It includes a position measurement unit for measuring the position of the substrate stage and a control unit that performs drive control to align the substrate based on the measured position. This apparatus is designed to achieve accurate alignment regardless of strains in the main body structure. The second patent outlines an exposure apparatus that incorporates a projection optical system for forming an image of a pattern on a master plate. It also includes a measurement device for assessing variations in forces acting on the main body structure, along with a correction device to enhance measurement accuracy.
Career Highlights
Fukagawa is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to develop innovative technologies that contribute to advancements in the field of device manufacturing.
Collaborations
One of his notable collaborators is Masami Yonekawa, with whom he has worked on various projects related to exposure apparatus technology.
Conclusion
Yozo Fukagawa's contributions to the field of exposure apparatus technology demonstrate his commitment to innovation and precision in device manufacturing. His patents reflect a deep understanding of the complexities involved in achieving accurate alignment and measurement in advanced manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
