The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2004
Filed:
Oct. 24, 2001
Masami Yonekawa, Utsunomiya, JP;
Yozo Fukagawa, Kawachi-gun, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Accurate alignment can be attained irrespective of strains of the main body structure. An exposure apparatus, which has a substrate stage ( ) which holds and moves a substrate ( ), a position measurement unit ( ) for measuring the position of the substrate stage, and a control unit ( ) for performing drive control of the substrate stage to align the substrate on the basis of the measured position, and which aligns the substrate and a master plate ( ), and forms a pattern on the master plate on the substrate by exposure, has a strain measurement unit ( ) for measuring strain of a structure ( ) to which the position measurement unit is fixed, and the control unit aligns the substrate by the drive control of the stage in consideration of the measured strain.