The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Apr. 12, 1999
Masami Yonekawa, Utsunomiya, JP;
Yozo Fukagawa, Kawachi-machi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus, which includes a projection optical system for forming an image of a pattern formed on a master plate, a substrate stage for holding and moving a substrate to be exposed to an imaging position, a position measurement device for measuring a position of the master plate or substrate or relative positions of the master plate and substrate, an alignment device for moving the master plate or substrate on the basis of a measurement value of the position measurement device to adjust the position or relative positions, a main body structure for holding the projection optical system, the substrate stage, and the position measurement device, and a support base for supporting the main body structure. The apparatus includes a measurement device for measuring a variation amount of a principal force acting between the main body structure and the support base or a physical quantity acting on the main body structure, and a correction device for correcting a measurement value of the measurement device using a correction vector obtained by multiplying the measurement result of the measurement device by a predetermined coefficient matrix.