Youngchul Park

Title: Youngchul Park: Innovator in Thin Film Technology

Introduction

Youngchul Park is a notable inventor based in Iksan-si, South Korea. He has made significant contributions to the field of thin film technology, holding a total of 3 patents. His work focuses on developing innovative etchant compositions that enhance the manufacturing processes of electronic components.

Latest Patents

One of Youngchul Park's latest patents is a thin film etchant composition and method of forming a metal pattern using the same. This composition is designed to prevent the re-adsorption of etched metal while ensuring uniform etching of thin films. The formulation includes approximately 43 wt % to 46 wt % of phosphoric acid, 5 wt % to 8 wt % of nitric acid, 10 wt % to 17 wt % of acetic acid, 1 wt % to 3 wt % of iron nitrate, 0.7 wt % to 1.5 wt % of phosphate, and deionized water as the remaining component.

Another significant patent involves an etchant composition for manufacturing thin film transistor substrates. This composition consists of 0.5 wt % to 20 wt % of persulfate, 0.01 wt % to 2 wt % of a fluorine compound, 1 wt % to 10 wt % of an inorganic acid, 0.5 wt % to 5 wt % of a cyclic amine compound, 0.1 wt % to 5 wt % of a chlorine compound, 0.1 wt % to 10 wt % of an aliphatic sulfonic acid, and 1 wt % to 20 wt % of an organic acid or its salt, along with water.

Career Highlights

Throughout his career, Youngchul Park has worked with prominent companies in the technology sector. He has been associated with Samsung Display Co., Ltd. and Dongwoo Fine-chem Co., Ltd., where he has contributed to advancements in display technologies and chemical compositions.

Collaborations

Youngchul Park has collaborated with notable colleagues, including Hongsick Park and Inseol Kuk. Their combined expertise has furthered the development of innovative solutions in the field of thin film technology.

Conclusion

Youngchul Park's contributions to thin film technology through his patents and collaborations highlight