Company Filing History:
Years Active: 2022-2024
Title: Yosuke Serizawa: Innovator in Semiconductor Technology
Introduction
Yosuke Serizawa is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative work focuses on methods and devices for film formation in semiconductor manufacturing.
Latest Patents
Serizawa's latest patents include a film forming method and a method for manufacturing semiconductor devices. One of his notable inventions is a method of forming a group V metal nitride film on a substrate. This process involves providing the substrate within a processing container and forming the film by alternately supplying a raw material gas that includes a group V metal and a reducing gas containing nitrogen. Another significant patent is a semiconductor film forming method using a hydrazine-based compound gas. This method includes a source gas adsorption process and a nitriding process, which utilizes a hydrazine-based compound gas as part or all of the nitriding gas.
Career Highlights
Yosuke Serizawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work at this organization has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.
Collaborations
Throughout his career, Serizawa has collaborated with notable colleagues, including Hiroaki Ashizawa and Hideo Nakamura. These partnerships have contributed to the advancement of semiconductor technologies and the successful development of his patents.
Conclusion
Yosuke Serizawa is a key figure in the semiconductor industry, with a focus on innovative film forming methods. His contributions through his patents and work at Tokyo Electron Limited highlight his importance in advancing semiconductor technology.