Yoshiyuki Funaki

Title: Innovations of Yoshiyuki Funaki

Introduction

Yoshiyuki Funaki is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of film formation technology, holding a total of 2 patents. His work focuses on advanced methods and apparatuses that enhance the efficiency and quality of film production.

Latest Patents

One of his latest patents is a "Method and apparatus for forming film." This invention utilizes plasma-enhanced chemical vapor deposition, incorporating a chamber, rotary electrode reels, a plasma source, a material gas supplier, and an exhaust unit. The process involves applying a negative voltage to the rotary electrode reels while a conductive substrate is fed out and wound on the take-up reel. This setup allows for the formation of a plasma sheath along the substrate's surface, activating the material gas and enabling film formation.

Another significant patent is the "Amorphous carbon film forming method and device." This apparatus features a film forming furnace and multiple workpiece fixtures that support plate-like workpieces stacked vertically. The design allows for efficient gas supply and stable discharge, facilitating the low-cost formation of amorphous carbon films.

Career Highlights

Yoshiyuki Funaki has worked with prominent companies such as Jtekt Corporation and Toyota Chuo Kenkyusho. His experience in these organizations has contributed to his expertise in film formation technologies.

Collaborations

He has collaborated with notable coworkers, including Kazuyuki Nakanishi and Kyouji Itou, further enhancing his innovative work in the field.

Conclusion

Yoshiyuki Funaki's contributions to film formation technology through his patents demonstrate his innovative spirit and commitment to advancing the industry. His work continues to influence the development of efficient and cost-effective film production methods.