Joetsu, Japan

Yoshinori Kinase


 

Average Co-Inventor Count = 6.4

ph-index = 3

Forward Citations = 42(Granted Patents)


Location History:

  • Niigata, JP (2009 - 2010)
  • Joetsu, JP (2009 - 2014)

Company Filing History:


Years Active: 2009-2014

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6 patents (USPTO):

Title: Inventor Yoshinori Kinase: Innovating in Photomask and Etching Technologies

Introduction

Yoshinori Kinase, an accomplished inventor based in Joetsu, Japan, has made significant contributions to the fields of photomask manufacturing and dry etching methods. With a portfolio of six patents, his groundbreaking work continues to influence the semiconductor industry, showcasing a blend of creativity and technical expertise.

Latest Patents

Kinase's recent innovations include a detailed dry etching method for work layers formed over substrates. This method involves forming a hard mask layer, creating a resist pattern, and executing a two-step etching process that adjusts the concentration of an auxiliary ingredient in the etching gas without altering the main ingredient. Another notable patent focuses on a photomask making method, where a photomask blank composed of a transparent substrate and a dual-layer light-shielding film is processed. This advances photomask technology by allowing for precise control in the etching process to achieve desirable film characteristics.

Career Highlights

Throughout his career, Kinase has worked with esteemed companies such as Shin-Etsu Chemical Co., Ltd. and Toppan Printing Co., Ltd. His tenure at these firms has contributed to his vast knowledge and experience in the field of innovative manufacturing processes, particularly in the development of advanced materials for semiconductor applications.

Collaborations

In his journey, Yoshinori Kinase has had the opportunity to collaborate with talented professionals, including Hiroki Yoshikawa and Yukio Inazuki. These partnerships have fostered an environment of innovation and shared expertise, further enhancing the impact of his work.

Conclusion

Yoshinori Kinase stands out as a key figure in the realm of photomask and etching methodologies. His six patents are a testament to his innovative spirit and technical proficiency, positioning him as a pivotal contributor to advancements in semiconductor technologies. As the industry continues to evolve, Kinase’s ongoing contributions will undoubtedly play a critical role in shaping the future of manufacturing processes.

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