Toyama, Japan

Yoshinobu Nakamura

USPTO Granted Patents = 19 

Average Co-Inventor Count = 3.3

ph-index = 5

Forward Citations = 52(Granted Patents)


Company Filing History:


Years Active: 2013-2020

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19 patents (USPTO):Explore Patents

Title: Innovations of Yoshinobu Nakamura: A Pioneer in Semiconductor Technology

Introduction

Yoshinobu Nakamura, an accomplished inventor based in Toyama, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 19 patents, Nakamura has established himself as a key figure in the development of advanced manufacturing techniques for semiconductor devices.

Latest Patents

Nakamura's latest patents feature innovative methods for manufacturing semiconductor devices. One patent details a method that involves supplying precursor gas into a process chamber where multiple substrates are processed. This method outlines the sequential flow of inert gas and precursor gas, including steps such as evacuating the chamber and removing residual gases. Another significant patent describes a process for manufacturing a semiconductor device by forming a nitride film containing carbon on an oxide film substrate, showcasing a series of cycles to optimize the material's properties.

Career Highlights

Throughout his career, Nakamura has worked at distinguished companies such as Hitachi Kokusai Electric Inc. and Kokusai Electric Corporation. His expertise has been instrumental in the advancement of semiconductor manufacturing processes, thereby shaping the innovative landscape of the industry.

Collaborations

Nakamura has collaborated with notable colleagues, including Ryota Sasajima and Yoshiro Hirose. Together, they have contributed to groundbreaking research and development in semiconductor technologies, enhancing the capabilities and efficiency of manufacturing processes.

Conclusion

Yoshinobu Nakamura’s dedication to innovation and his extensive patent portfolio underscore his status as a leading inventor in semiconductor technology. His contributions continue to pave the way for enhanced manufacturing techniques, making a lasting impact on the field.

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