The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2016

Filed:

Jan. 09, 2012
Applicants:

Yoshiro Hirose, Toyama, JP;

Yushin Takasawa, Toyama, JP;

Tsukasa Kamakura, Toyama, JP;

Yoshinobu Nakamura, Toyama, JP;

Ryota Sasajima, Toyama, JP;

Inventors:

Yoshiro Hirose, Toyama, JP;

Yushin Takasawa, Toyama, JP;

Tsukasa Kamakura, Toyama, JP;

Yoshinobu Nakamura, Toyama, JP;

Ryota Sasajima, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/314 (2006.01); H01L 21/02 (2006.01); C23C 16/30 (2006.01); C23C 16/36 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); C23C 16/30 (2013.01); C23C 16/36 (2013.01); C23C 16/40 (2013.01); C23C 16/401 (2013.01); C23C 16/45523 (2013.01); C23C 16/45529 (2013.01); C23C 16/45531 (2013.01); C23C 16/45546 (2013.01); H01L 21/0217 (2013.01); H01L 21/02112 (2013.01); H01L 21/02126 (2013.01); H01L 21/02167 (2013.01); H01L 21/02211 (2013.01);
Abstract

An insulating film including characteristics such as low permittivity, a low etching rate and a high insulation property is formed. Supplying a gas containing an element, a carbon-containing gas and a nitrogen-containing gas to a heated substrate in a processing vessel to form a carbonitride layer including the element, and supplying the gas containing the element and an oxygen-containing gas to the heated substrate in the processing vessel to form an oxide layer including the element are alternately repeated to form on the substrate an oxycarbonitride film having the carbonitride layer and the oxide layer alternately stacked therein.


Find Patent Forward Citations

Loading…