Gifu, Japan

Yoshinari Ichihashi


Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Gifu-ken, JP (2005)
  • Gifu, JP (2006 - 2007)

Company Filing History:


Years Active: 2005-2007

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3 patents (USPTO):Explore Patents

Title: Yoshinari Ichihashi: Innovator in Semiconductor Manufacturing

Introduction

Yoshinari Ichihashi is a prominent inventor hailing from Gifu, Japan, recognized for his significant contributions to the field of semiconductor manufacturing. With a total of three patents to his name, Ichihashi has developed innovative methods that enhance semiconductor device fabrication processes.

Latest Patents

Ichihashi's latest patents include a groundbreaking method of manufacturing semiconductor devices, which involves a comprehensive approach to forming conductive layers and controlling etching processes. This method outlines the sequential formation of a first interconnection, diffusion barrier film, and a second insulating film, followed by the application of a sacrificial film. A unique two-step chemical mechanical polishing (CMP) process is described to ensure the precise removal of extraneous materials, delivering efficiency and effectiveness in semiconductor production.

Another notable patent focuses on a semiconductor device designed to suppress microloading effects and over-etching during the formation of fine contact holes, which are essential in high-aspect-ratio applications. This invention incorporates a dual-layer insulator film, consisting of an upper insulator layer and a lower insulator layer made of different materials, to achieve better control during etching processes and improve overall device reliability.

Career Highlights

Ichihashi is currently associated with Sanyo Electric Co., Ltd., where he has played a pivotal role in advancing semiconductor technology. His work emphasizes the importance of precision in manufacturing processes, contributing to the production of more efficient and reliable semiconductor devices.

Collaborations

Throughout his career, Ichihashi has collaborated with fellow innovators, including Yoshio Okayama and Hayato Nakashima. These collaborations have enabled a dynamic exchange of ideas and fostered a creative environment that produces cutting-edge technology in semiconductor manufacturing.

Conclusion

Yoshinari Ichihashi's work in semiconductor manufacturing exemplifies the spirit of innovation within the industry. His patents not only advance technical processes but also contribute to the ongoing evolution of semiconductor technology. As the industry continues to grow, Ichihashi's contributions are likely to be influential in shaping the future of electronics.

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