Yokohama, Japan

Yoshinao Kamo

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.4

ph-index = 1


Company Filing History:


Years Active: 2019-2025

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4 patents (USPTO):Explore Patents

Title: The Innovations of Inventor Yoshinao Kamo

Introduction

Yoshinao Kamo is a prominent inventor based in Yokohama, Japan. With a total of four patents to his name, he has made significant contributions to the field of electronics and materials science. His innovative work continues to impact various technological applications.

Latest Patents

Kamo's latest patents include an electromagnetic wave attenuator, an electronic device, a film formation apparatus, and a film formation method. The electromagnetic wave attenuator design involves a first structure body, which consists of three members. The first member features an alternating arrangement of a first magnetic layer and a first conductive nonmagnetic layer in a stacking direction. Likewise, the second member follows a similar pattern with a second magnetic layer and a conductive nonmagnetic layer. The third member presents a conductive nonmagnetic layer as well. Notably, the thickness of the first magnetic layer is greater than that of the second magnetic layer. This intricate layering arrangement plays a crucial role in the performance of the electromagnetic wave attenuator.

Career Highlights

Yoshinao Kamo has dedicated his career to advancing technology through innovative inventions. His role at Shibaura Mechatronics Corporation has allowed him to contribute to various projects and develop cutting-edge technologies in electronics and materials.

Collaborations

Throughout his career, Kamo has collaborated with talented individuals, including coworkers Shigeki Matsunaka and Atsushi Fujita. Working alongside these professionals, he has further enhanced the quality and impact of his inventions.

Conclusion

Yoshinao Kamo's work exemplifies the spirit of innovation and dedication to improving technological solutions. With a focus on electromagnetic wave attenuation and film formation methods, his contributions continue to influence the industry and pave the way for future advancements in electronics.

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