Tokyo, Japan

Yoshiko Yoshida


Average Co-Inventor Count = 6.0

ph-index = 3

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2001-2005

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3 patents (USPTO):Explore Patents

Title: The Innovations of Yoshiko Yoshida

Introduction

Yoshiko Yoshida is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her work focuses on improving semiconductor substrates, which are crucial for the performance and reliability of electronic devices.

Latest Patents

Yoshiko's latest patents include a semiconductor substrate with stacked oxide and SOI layers. This innovative substrate prevents the formation of particles from the edge part of the substrate. It features an on-substrate oxide film and an SOI layer stacked on the oxide film. A molten layer is formed on the edge part of the on-substrate oxide film and the SOI layer by mixing the two layers to cover the edge part. Additionally, an epitaxial layer may also be formed on the edge part to enhance its performance. Another notable patent is a semiconductor substrate processing method aimed at preventing particle formation from the edge part of the substrate. This method involves implanting silicon ions into the edge part of an SOI substrate to bring a buried oxide film into a silicon-rich state, effectively eliminating the buried oxide film in that area.

Career Highlights

Yoshiko has worked with several notable companies throughout her career, including Mitsubishi Electric Corporation and Renesas Technology Corporation. Her experience in these organizations has allowed her to develop and refine her innovative ideas in semiconductor technology.

Collaborations

Yoshiko has collaborated with esteemed colleagues such as Hideki Naruoka and Yasuhiro Kimura. Their combined expertise has contributed to the advancement of semiconductor technologies and innovations.

Conclusion

Yoshiko Yoshida's contributions to semiconductor technology are noteworthy and impactful. Her innovative patents and collaborations highlight her dedication to advancing the field. Her work continues to influence the development of reliable and efficient electronic devices.

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