Tokyo, Japan

Yoshihisa Nonogaki

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.2

ph-index = 3

Forward Citations = 26(Granted Patents)


Location History:

  • Imari, JP (2007)
  • Tokyo, JP (2003 - 2012)

Company Filing History:


Years Active: 2003-2012

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5 patents (USPTO):Explore Patents

Title: Innovations of Yoshihisa Nonogaki: A Pioneer in Epitaxial Wafer Technology

Introduction

Yoshihisa Nonogaki, an esteemed inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology with his innovative developments. With a remarkable portfolio, encompassing a total of five patents, Nonogaki has positioned himself as a key figure in the advancement of epitaxial wafer production.

Latest Patents

Among his latest inventions is a groundbreaking patent for an epitaxial wafer and the accompanying production method. This innovative process involves ion-implanting a small amount of oxygen into the surface layer of the wafer, followed by heat treatment that forms an incomplete implanted oxide film. This method not only reduces wafer costs but also prevents the formation of pits on the epitaxial film's surface, while effectively preventing slip in the external peripheral regions of the wafer. Such advancements are vital for enhancing the efficiency and quality of semiconductor production.

Career Highlights

Throughout his illustrious career, Yoshihisa Nonogaki has worked with prominent companies such as Sumco Corporation and Mitsubishi Materials Silicon Corporation. His experience in these leading firms has equipped him with invaluable insights and expertise in the semiconductor industry, further bolstering his inventive capabilities.

Collaborations

In his journey as an inventor, Nonogaki has collaborated with talented professionals, including esteemed colleagues Akihiko Endo and Yoshiro Aoki. These partnerships have not only contributed to his success but also fostered a culture of innovation and excellence within the industry.

Conclusion

Yoshihisa Nonogaki's achievements in the realm of epitaxial wafer technology attest to his role as a pioneering inventor. His patents not only improve production methodologies but also contribute to the overall advancement of semiconductor technology. As he continues to innovate, the impact of his work will undoubtedly resonate within the field for years to come.

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