Company Filing History:
Years Active: 2016-2017
Title: Innovations by Yoshihiro Fukui
Introduction
Yoshihiro Fukui is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of antireflective technology, holding a total of 2 patents. His work focuses on enhancing the scratch resistance of antireflective articles, particularly those with a moth-eye structure.
Latest Patents
Fukui's latest patents include innovative designs for antireflective articles and image display devices. One of his patents describes an antireflective article that features fine protrusions densely arranged to improve scratch resistance. The intervals between adjacent fine protrusions are designed to be no more than the shortest wavelength in the electromagnetic wavelength band for antireflection. Additionally, some of these fine protrusions possess multiple apexes, enhancing their effectiveness. Another patent outlines a production mold for antireflective articles, emphasizing a non-lattice arrangement of fine protrusions that aligns with Voronoi tessellation principles.
Career Highlights
Yoshihiro Fukui is currently employed at Dai Nippon Printing Co., Ltd., where he continues to innovate in the field of optical technologies. His work has garnered attention for its practical applications in various industries, particularly in improving the durability and performance of display devices.
Collaborations
Fukui collaborates with talented colleagues, including Hironori Kamiyama and Yuichi Miyazaki. Their combined expertise contributes to the advancement of antireflective technologies and the development of new applications.
Conclusion
Yoshihiro Fukui's contributions to antireflective technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of optical properties and materials science, paving the way for future advancements in the field.