The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2017

Filed:

Jul. 31, 2013
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Yoshihiro Fukui, Tokyo, JP;

Hironori Kamiyama, Tokyo, JP;

Yuichi Miyazaki, Tokyo, JP;

Takafumi Shibata, Tokyo, JP;

Masafumi Tanaka, Tokyo, JP;

Kazuo Matsufuji, Tokyo, JP;

Nobu Masubuchi, Tokyo, JP;

Yuri Shimozaki, Tokyo, JP;

Youichirou Oohashi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01); B29C 33/38 (2006.01); G02B 1/118 (2015.01); B29C 59/04 (2006.01); B29C 33/42 (2006.01); B29C 35/08 (2006.01); B29L 11/00 (2006.01);
U.S. Cl.
CPC ...
G02B 1/118 (2013.01); B29C 33/3842 (2013.01); B29C 33/424 (2013.01); B29C 59/02 (2013.01); B29C 59/046 (2013.01); B29C 2035/0827 (2013.01); B29C 2059/023 (2013.01); B29K 2995/0072 (2013.01); B29K 2995/0074 (2013.01); B29L 2011/00 (2013.01); G02F 2201/38 (2013.01); Y10T 428/24355 (2015.01);
Abstract

In order to improve the scratch resistance of an antireflective article having a moth-eye structure, an antireflective article is provided that has fine protrusions densely arranged therein, and has the interval between adjacent fine protrusions being no more than the shortest wavelength in the wavelength band for antireflection. At least some of the fine protrusions are fine protrusions having a plurality of apexes.


Find Patent Forward Citations

Loading…