Osaka, Japan

Keiwa Inc.


USPTO Granted Patents = 66

% Expired Patents = 7.6


Trademarks = 12

Forward Citations = 161

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41 inventors (with patents filed for the assignee):

goldMedal Chengheng Tsai (14 out of 14 patents)

silverMedal Motohiko Okabe (13 out of 25 patents)

bronzeMedal Kenichi Harada (11 out of 20 patents)

4.  Takahiro Tsuji (11 out of 19 patents)

5.  Masayuki Sukigara (7 out of 8 patents)

6.  Yoshitada Namikawa (7 out of 7 patents)

7.  Yuki Matsuno (6 out of 6 patents)

8.  Chengheng Tsai (5 out of 5 patents)

9.  Hironori Nakashima (5 out of 5 patents)

10.  Akira Furuta (5 out of 20 patents)

11.  Tadayoshi Fukuda (4 out of 4 patents)

12.  Satoshi Shiba (3 out of 3 patents)

13.  Tadayuki Nonaka (3 out of 3 patents)

14.  Hirohisa Dejima (2 out of 2 patents)

15.  Akira Arakawa (2 out of 2 patents)


Core Competencies:
Backlight Unit
Optical Sheet
Light Diffusion Sheet
Liquid Crystal Display
Display Device
Protective Film
Diffusion Plate
Optical Waveguide

66 patents:

Company Overview
Keiwa Inc., based in Osaka, Japan, specializes in the development and manufacturing of advanced backlight unit technology. The company focuses on creating high-performance optical sheets, light diffusion sheets, and protective films that enhance the functionality and visual quality of liquid crystal displays and other display devices. With a commitment to innovation, Keiwa plays a significant role in the display technology sector, providing solutions that improve light management and overall display performance.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Oct 20 2026

66 Patents

#155 in Osaka

#1,459 in Japan

#11,177 in the World

Osaka, JP
Osaka, Japan
Forward Citations = 161

41 inventors:

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Keiwa Inc.. Retrieved from https://idiyas.com/company/keiwa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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