The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2026

Filed:

May. 01, 2024
Applicant:

Keiwa Incorporated, Tokyo, JP;

Inventors:

Masayuki Sukigara, Tokyo, JP;

Akira Furuta, Tokyo, JP;

Assignee:

KEIWA Incorporated, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/02 (2006.01); B32B 3/30 (2006.01); B32B 27/36 (2006.01); G02F 1/13357 (2006.01);
U.S. Cl.
CPC ...
G02B 5/02 (2013.01); B32B 3/30 (2013.01); B32B 27/365 (2013.01); G02B 5/0268 (2013.01); G02F 1/133606 (2013.01); B32B 2307/414 (2013.01); B32B 2457/202 (2013.01);
Abstract

A light diffusion sheetincludes a polycarbonate resin including a first structural unit derived from a dihydroxy compound represented by the following formula (1). The light diffusion sheetincludes, at least in its first surface, recessesformed in a substantially inverted polygon pyramid or in a substantially inverted truncated polygon pyramid. The ridgeparting the recesseshas a recessed shape between the intersections. A ratio Wr/P is 0.3 or less, where P is the arrangement pitch of the recessesand Wr is the dimension occupied by a curved portion at the top portion of the ridgein the arrangement direction of the recesses. The maximum height difference d between the ridgeand the straight line connecting the intersectionsis 1 μm or more and 10 μm or less.


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