The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2016
Filed:
Jul. 31, 2013
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Yoshihiro Fukui, Tokyo, JP;
Hironori Kamiyama, Tokyo, JP;
Yuichi Miyazaki, Tokyo, JP;
Takafumi Shibata, Tokyo, JP;
Masafumi Tanaka, Tokyo, JP;
Kazuo Matsufuji, Tokyo, JP;
Yuri Shimozaki, Tokyo, JP;
DAI NIPPON PRINTING CO., LTD., Tokyo, JP;
Abstract
In order to improve the scratch resistance of an antireflective article having a moth-eye structure, an antireflective article is provided that has fine protrusions densely arranged therein, has the interval between adjacent fine protrusions being no more than the shortest wavelength for an electromagnetic wavelength band for antireflection, and wherein: the fine protrusions are arranged in a non-lattice shape in the planar view; and mesh division lines formed upon the valley sections between each adjacent fine protrusions and surrounding each fine protrusion match Voronoi tessellation having the center of gravity of the fine protrusions, in the planar view as the generating point therefor, in at least one area of the antireflective article.