Saijo, Japan

Yoshihide Kawamura


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Yoshihide Kawamura

Introduction

Yoshihide Kawamura is a notable inventor based in Saijo, Japan. He has made significant contributions to the field of polishing technology, particularly through his innovative patent that addresses minute defects in workpieces.

Latest Patents

Kawamura holds a patent for a polishing pad and method for manufacturing the same. This polishing pad is designed to effectively reduce minute defects that can occur after polishing, especially those detected in measurements for particle sizes of 26 nm or smaller. The invention features a polishing layer with a polishing surface, an intermediate layer with a larger amount of deformation than the polishing layer, a hard layer with a smaller amount of deformation, and a cushion layer with a larger amount of deformation than the intermediate layer. This unique layering structure allows for excellent surface flatness on the workpiece.

Career Highlights

Throughout his career, Yoshihide Kawamura has worked with prominent companies such as Fujibo Holdings, Inc. and Shin-Etsu Handotai Co., Ltd. His experience in these organizations has contributed to his expertise in the field of polishing technology.

Collaborations

Kawamura has collaborated with notable coworkers, including Michito Sato and Junichi Ueno. Their combined efforts have further advanced the innovations in polishing technology.

Conclusion

Yoshihide Kawamura's contributions to polishing technology through his patent demonstrate his commitment to innovation and excellence. His work continues to influence the industry and improve the quality of workpieces.

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