The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Sep. 29, 2021
Fujibo Holdings, Inc., Tokyo, JP;
Yoshihide Kawamura, Saijo, JP;
Teppei Tateno, Saijo, JP;
Ryuma Matsuoka, Saijo, JP;
Hiroshi Kurihara, Saijo, JP;
Satsuki Narushima, Saijo, JP;
Yamato Takamizawa, Saijo, JP;
Keisuke Ochi, Saijo, JP;
Tetsuaki Kawasaki, Saijo, JP;
FUJIBO HOLDINGS, INC., Tokyo, JP;
Abstract
A polishing pad contains: a polishing layer having a polishing surface for polishing a workpiece; and a cushion layer disposed on the side of the polishing layer opposite from the polishing surface. With regard to the ratio (tan δ) of the storage elastic modulus E' to the loss elastic modulus E″ of the whole polishing pad, as obtained through dynamic viscoelasticity measurement using frequency dispersion (25° C.) in a bending mode, the ratio of the maximum value of tan δ measured at 100-1000 rad/s (tan δ) to the maximum value of tan δ measured at 1 to 10 rad/s (tan δ) is 0.75 to 1.30.