Location History:
- Yokkaichi, JP (2004 - 2013)
- Mie-ken, JP (2004 - 2017)
Company Filing History:
Years Active: 2004-2017
Title: Yoshiaki Himeno: Innovator in Semiconductor Technology
Introduction
Yoshiaki Himeno is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on the development of nonvolatile semiconductor memory devices and methods for manufacturing them.
Latest Patents
Among his latest patents is a nonvolatile semiconductor memory device and method for manufacturing the same. This invention includes an interlayer insulating film, an element separating region, and a gate electrode provided on one of the plurality of semiconductor regions in the memory cell region. Additionally, it features a contact electrode that is electrically connected to the semiconductor regions, along with a first and second wiring layer designed to enhance the device's functionality. Another notable patent involves a semiconductor device that comprises a semiconductor substrate and an insulating film, which contains buried wirings arranged at predetermined intervals.
Career Highlights
Yoshiaki Himeno has had a distinguished career at Kabushiki Kaisha Toshiba, where he has been instrumental in advancing semiconductor technologies. His innovative approaches have led to the development of cutting-edge devices that are essential in modern electronics.
Collaborations
Throughout his career, Yoshiaki has collaborated with notable colleagues, including Hiroaki Tsunoda and Tadashi Iguchi. These partnerships have fostered a creative environment that has contributed to the success of their projects.
Conclusion
Yoshiaki Himeno's contributions to semiconductor technology are noteworthy, and his patents reflect his innovative spirit and dedication to advancing the field. His work continues to influence the development of modern electronic devices.