Seoul, South Korea

YoonKi Min


Average Co-Inventor Count = 6.5

ph-index = 1

Forward Citations = 363(Granted Patents)


Company Filing History:


Years Active: 2020-2023

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6 patents (USPTO):

Title: YoonKi Min: Innovator in Silicon Nitride Film Technology

Introduction

YoonKi Min is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for forming silicon nitride films. With a total of six patents to his name, Min's work has advanced the capabilities of substrate processing in various applications.

Latest Patents

YoonKi Min's latest patents include a method for forming silicon nitride film selectively on top and bottom portions of a substrate. This innovative method involves simultaneously forming a dielectric film containing a Si—N bond on the upper surface, bottom surface, and sidewalls of a trench. The top and bottom portions of the film are given different chemical resistance properties through plasma bombardment, allowing for selective removal of the sidewall portion by wet etching. Another notable patent is a substrate processing method that achieves uniform etch selectivity across the entire thickness range of a thin film on a stepped structure. This method includes forming a thin film through multiple cycles and applying plasma under varying process conditions.

Career Highlights

YoonKi Min is currently employed at ASML Holding B.V., a leading company in the semiconductor industry. His work at ASML has positioned him as a key player in advancing technologies that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, YoonKi Min has collaborated with notable colleagues, including SeungJu Chun and Dai Ishikawa. These collaborations have contributed to the innovative advancements in the technologies he has developed.

Conclusion

YoonKi Min's contributions to the field of semiconductor technology through his patents and innovative methods have established him as a significant figure in the industry. His work continues to influence advancements in substrate processing and silicon nitride film technology.

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