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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11562901 B1

PDFFull Text
Date of Patent:
Jan. 24, 2023

Filed:

Sep. 16, 2020

Substrate processing method

Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

HeeSung Kang, Osan-si, KR;

YoonKi Min, Seoul, KR;

WanGyu Lim, Icheon-si, KR;

SeokJae Oh, Suwon-si, KR;

SeongIl Cho, Cheonan-si, KR;

Assignee:

ASM IP Holding B.V., Versterkerstrasse, NL;

Attorney:

Snell & Wilmer L.L.P.

Primary Examiner:

Katherine A Bareford

Assistant Examiner:

Christina D McClure

Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0234 (2013.01); H01L 21/0228 (2013.01); H01L 21/02274 (2013.01); H01L 21/31111 (2013.01); H01L 21/0214 (2013.01); H01L 21/0217 (2013.01);
Abstract

A substrate processing method capable of achieving uniform etch selectivity in the entire thickness range of a thin film formed on a stepped structure includes: forming a thin film on a substrate by performing a plurality of cycles including forming at least one layer and applying plasma to the at least one layer under a first process condition; and applying plasma to the thin film under a second process condition different from the first process condition.

Find Patent Forward Citations

Kang, HeeSung. (2023). Substrate processing method (U.S. Patent No. 11562901). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11562901

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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