Company Filing History:
Years Active: 2022-2025
Title: Innovations by WanGyu Lim in Substrate Processing Methods
Introduction
WanGyu Lim is a notable inventor based in Icheon-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of four patents. His work focuses on methods that enhance the efficiency and effectiveness of thin film applications.
Latest Patents
Among his latest patents, WanGyu Lim has developed a substrate processing method that is capable of filling a film in a gap structure without forming voids or seams. This method includes several steps: first, a thin film is formed on a structure with a gap by performing a cycle that involves supplying a first and a second reaction gas multiple times. The second step involves etching a portion of the thin film using a fluorine-containing gas. The third step includes supplying a hydrogen-containing gas, followed by the fourth step where an inhibiting gas is applied to the upper portion of the gap. Finally, the fifth step involves forming a thin film through a second cycle of supplying the first and second reaction gases.
Another innovative patent by Lim focuses on achieving uniform etch selectivity across the entire thickness range of a thin film on a stepped structure. This method involves forming a thin film on a substrate through multiple cycles, including applying plasma under different process conditions to ensure optimal results.
Career Highlights
WanGyu Lim is currently employed at ASML Holding B.V., a company renowned for its advanced technology in the semiconductor industry. His expertise in substrate processing methods has positioned him as a key contributor to the company's innovative projects.
Collaborations
Throughout his career, WanGyu Lim has collaborated with notable colleagues, including HeeSung Kang and JaeOk Ko. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in substrate processing.
Conclusion
WanGyu Lim's contributions to substrate processing methods demonstrate his commitment to innovation in the semiconductor field. His patents reflect a deep understanding of the complexities involved in thin film applications, making him a valuable asset to ASML Holding B.V. and the broader technological community.