The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2022
Filed:
Sep. 09, 2019
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
KiChul Um, Osan-si, KR;
JeungHoon Han, Yongin-si, KR;
DooHan Kim, Cheonan-si, KR;
YongGyu Han, Seoul, KR;
TaeHee Yoo, Bucheon-si, KR;
WanGyu Lim, Icheon-si, KR;
DongHyun Ko, Osan-si, KR;
Assignee:
ASM IP Holding B.V., Versterkerstraat, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45536 (2013.01); C23C 16/4586 (2013.01); H01J 37/32174 (2013.01); H01J 37/32568 (2013.01); H01J 37/32724 (2013.01); H01L 21/0228 (2013.01); H01L 21/02274 (2013.01); H01J 2237/3321 (2013.01);
Abstract
A thin film deposition method with respect to a substrate including a pattern structure includes supplying RF power through a component disposed below a substrate, forming a potential on an exposed surface of the substrate exposed to a reaction space, moving the active species to the exposed surface in the reaction space using the potential, and forming a thin film including active species component on the exposed surface of the substrate.