TaeHee Yoo

Title: Innovations of Inventor TaeHee Yoo

Introduction

TaeHee Yoo is a notable inventor based in Bucheon-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of three patents. His work focuses on methods that enhance the efficiency and effectiveness of substrate processing techniques.

Latest Patents

One of his latest patents is a substrate processing method that fills a recess without voids or seams. This method involves partially filling a trench with a first material on a substrate and supplying at least one constituent element included in the first material while applying plasma to induce fluidization. Another significant patent is a thin film forming method designed to fill a gap without seams or voids. This process includes providing a substrate with a gap in a reaction chamber, reducing the pressure in the chamber to 5 Torr or below, and filling the gap with a film by alternately supplying a precursor, a reactant, and radio frequency electromagnetic radiation.

Career Highlights

TaeHee Yoo is currently employed at ASM IP Holding B.V., where he continues to innovate in the field of substrate processing. His expertise and dedication to advancing technology have made him a valuable asset to his company.

Collaborations

He has collaborated with notable coworkers such as KiChul Um and JeungHoon Han, contributing to various projects and innovations in their field.

Conclusion

TaeHee Yoo's contributions to substrate processing through his innovative patents highlight his role as a significant inventor in the industry. His work continues to influence advancements in technology and processing methods.