Osan-si, South Korea

DongHyun Ko

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of DongHyun Ko

Introduction

DongHyun Ko is a notable inventor based in Osan-si, South Korea. He has made significant contributions to the field of thin film deposition technology. His innovative approach has led to the development of a unique method that enhances the efficiency and effectiveness of thin film applications.

Latest Patents

DongHyun Ko holds a patent for a thin film deposition method. This method involves supplying RF power through a component located below a substrate. It also includes forming a potential on the exposed surface of the substrate that is in the reaction space. The process moves active species to the exposed surface using the potential, ultimately forming a thin film that includes the active species component on the substrate.

Career Highlights

DongHyun Ko is currently associated with ASM IP Holding B.V., a company known for its advancements in semiconductor manufacturing technology. His work at ASM IP Holding B.V. has allowed him to further develop his expertise in thin film deposition methods.

Collaborations

He has collaborated with notable colleagues such as KiChul Um and JeungHoon Han, contributing to the advancement of their shared field of expertise.

Conclusion

DongHyun Ko's innovative work in thin film deposition methods showcases his commitment to advancing technology in the semiconductor industry. His contributions are significant and continue to influence the field positively.

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