Yongyue Chen

Title: **Innovator Yongyue Chen: Pioneering Advances in Microelectronics**

Introduction

Yongyue Chen is a distinguished inventor based in Shanghai, China, with a significant contribution to the field of microelectronics. Holding two patents, Chen has focused on enhancing fabrication technologies and processes that improve the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Chen's latest innovations include two impactful patents. The first is a **Fabrication Technology for Metal Gate**, which proposes a method of fabricating metal gates by introducing special layers instead of the traditional titanium nitride hard mask. This method minimizes the loss of the interlayer dielectric (ILD0) during conventional chemical-mechanical polishing (CMP). Key steps in this process involve forming a first thin ashable film layer over the ILD0 layer, followed by a second thin dielectric layer, and utilizing ashing methods to effectively reduce ILD0 losses during aluminum CMP operations.

The second patent involves an **Integration Process of FinFET Spacer Formation**. This innovation introduces a novel plasma process that enhances the formation of spacers for FinFET devices. By deploying a low-energy plasma gas for over-etching corner areas of sidewalls, Chen's method effectively protects the sidewall materials, reduces critical dimension (CD) losses, and avoids damaging the fin silicon structure, improving overall semiconductor device integrity.

Career Highlights

Yongyue Chen is currently associated with Shanghai Huali Microelectronics Corporation, known for its significant strides in the semiconductor industry. His expertise in fabrication technologies has significantly bolstered the company's capability to produce advanced microelectronic devices.

Collaborations

Throughout his career, Chen has collaborated with notable colleagues, including Tong Lei and HaiFeng Zhou. These partnerships have fostered a productive environment for innovation and have led to the successful development of cutting-edge technologies in microelectronics.

Conclusion

Yongyue Chen's contributions to microelectronics through his innovative patents and collaborative efforts showcase the essential role of inventors in advancing technology. His work not only enhances fabrication processes but also sets the stage for future breakthroughs in the semiconductor industry.